JPH0749790Y2 - 半導体ウェーハの洗浄装置 - Google Patents
半導体ウェーハの洗浄装置Info
- Publication number
- JPH0749790Y2 JPH0749790Y2 JP1989012041U JP1204189U JPH0749790Y2 JP H0749790 Y2 JPH0749790 Y2 JP H0749790Y2 JP 1989012041 U JP1989012041 U JP 1989012041U JP 1204189 U JP1204189 U JP 1204189U JP H0749790 Y2 JPH0749790 Y2 JP H0749790Y2
- Authority
- JP
- Japan
- Prior art keywords
- cleaning
- semiconductor wafer
- solution
- tank
- liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004140 cleaning Methods 0.000 title claims description 49
- 239000004065 semiconductor Substances 0.000 title claims description 15
- 239000000126 substance Substances 0.000 claims description 13
- 238000010438 heat treatment Methods 0.000 claims description 11
- 239000007788 liquid Substances 0.000 description 27
- 239000000243 solution Substances 0.000 description 17
- 235000012431 wafers Nutrition 0.000 description 11
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 6
- 235000011114 ammonium hydroxide Nutrition 0.000 description 6
- QOSATHPSBFQAML-UHFFFAOYSA-N hydrogen peroxide;hydrate Chemical compound O.OO QOSATHPSBFQAML-UHFFFAOYSA-N 0.000 description 5
- 238000010586 diagram Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 238000005502 peroxidation Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
Landscapes
- Cleaning Or Drying Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1989012041U JPH0749790Y2 (ja) | 1989-02-02 | 1989-02-02 | 半導体ウェーハの洗浄装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1989012041U JPH0749790Y2 (ja) | 1989-02-02 | 1989-02-02 | 半導体ウェーハの洗浄装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02102725U JPH02102725U (en]) | 1990-08-15 |
| JPH0749790Y2 true JPH0749790Y2 (ja) | 1995-11-13 |
Family
ID=31221128
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1989012041U Expired - Lifetime JPH0749790Y2 (ja) | 1989-02-02 | 1989-02-02 | 半導体ウェーハの洗浄装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0749790Y2 (en]) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109673107A (zh) * | 2018-12-13 | 2019-04-23 | 重庆方正高密电子有限公司 | 褪洗设备和生产线 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59215729A (ja) * | 1983-05-21 | 1984-12-05 | Ulvac Corp | 半導体もしくは磁気記録媒体等の基板の洗浄装置 |
| JPS63128186A (ja) * | 1986-11-17 | 1988-05-31 | Hitachi Ltd | 湿式エツチング装置 |
| JPS63272040A (ja) * | 1987-04-30 | 1988-11-09 | Fujitsu Ltd | 循環濾過洗浄装置 |
-
1989
- 1989-02-02 JP JP1989012041U patent/JPH0749790Y2/ja not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH02102725U (en]) | 1990-08-15 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |